Wide range microwave plasma CVD apparatus and its growth method

摘要

A wide range microwave plasma chemical vapor deposition (LA MPCVD) reactor apparatus and method for wide area microwave chemical vapor depositionA reactor chamber having a plasma region inside the reactor chamber by electromagnetic energy of the first frequency andThe first frequency is adapted to operate at an infinite wavelength and within the wallA CRLH waveguide region having coupler means arranged to couple electromagnetic energy inside the CRLH waveguide region to the interior of the reactor chamber and.