STI CMP ABRASIVE SLURRY COMPOSITION FOR STI CMP AND METHOD FOR PREPARING THEREOF

摘要

The present invention relates to a polishing slurry composition for an STI CMP process and a method for preparing the same, characterized in that it contains abrasive particles and a chaotropic agent. Advantageous Effects of Invention According to the present invention, it is possible to provide a polishing slurry composition for an STI CMP process having excellent dishing performance, a high nitride film polishing rate, and a characteristic that the nitride and oxide film thicknesses are constant and rapidly decrease, and a method for manufacturing the same.