Polymer, photosensitive resin composition, pattern forming method, hardened film forming method, interlayer insulating film, surface protective film, and electronic component

摘要

It is soluble in an alkaline aqueous solution and can form a fine pattern and can obtain high resolution A positive type photosensitive resin composition having good mechanical characteristics even when curing at low temperatures and a polymer which can be used as a base resin of a negative type photosensitive resin composition are provided. A positive type photosensitive resin composition and a negative type photosensitive resin composition using the polymer are provided.Solution: the polymer comprises structural units represented by the following formula (1).(T1, T2 may be the same or different between the two, and one of - co -, - SO2, X1 is a quaternary organic group, l is 0 or 1)No selection