Deposition mask defect cause determining system, evaporation mask defect cause determination method and program

摘要

A deposition mask defect cause system to determine the cause of defects in a deposition mask having a substrate having a plurality of holes formed thereinA plurality of holes to be photographed with a plurality of holes including a normal hole portion and a defective hole portionA substrate portion imaged with the substrate surrounding the plurality of holes andImage acquisition section which acquires the imaging image of said deposition mask includingA first area calculating section for calculating an area of a normal hole portion included in an imaging image acquired by an image acquisition section and aA second area calculating section for calculating the area of a defective hole portion included in the imaging image acquired by the image acquisition section andArea ratio calculation section which calculates the area ratio which is the proportion of the area of the defective hole part to the area of the normal hole part, andComprises a defect cause identifying portion for identifying a cause of a defective hole portionDefect cause specific partIfCause of the defective hole partIdentify the first or second causeIf the area ratio is less than 1Cause of the defective hole partIt is identified that the cause is neither the first cause nor the second cause.