Deposition Mask Defect Causes Specific Systems, Deposition Mask Defect Causes Specific Methods and Programs

摘要

A deposition mask defect cause specifying system for specifying a defect cause of a deposition mask having a substrate having a plurality of holes formed therein includes: a plurality of hole portions obtained by imaging the plurality of holes including normal hole portions and defective hole portions; an image acquisition unit that acquires a captured image of the deposition mask including a substrate portion in which the substrate around the substrate is imaged, and a first area that calculates the area of the top hole included in the captured image acquired by the image acquisition unit A calculation unit, a second area calculation unit for calculating the area of the defective hole portion included in the captured image acquired by the image acquisition unit, and calculating an area ratio that is a ratio of the area of the defective hole portion to the area of the normal hole portion and a defect cause specifying unit for specifying the cause of the defective hole portion; It is specified, and when the area ratio is less than 1, it is specified that the cause of the defective hole portion is a cause that is neither the first cause nor the second cause.