COMPONENT CARRIER WITH A PHOTOIMAGABLE DIELECTRIC LAYER AND A STRUCTURED CONDUCTIVE LAYER BEING USED AS A MASK FOR SELECTIVELY EXPOSING THE PHOTOIMAGABLE DIELECTRIC LAYER WITH ELECTROMAGNETIC RADIATION

摘要

It is described a component carrier (100) comprising (a) a layer stack (110) comprising at least one component carrier material; and (b) a photoimagable dielectric layer structure (120) formed on top of the layer stack (110). The photoimagable dielectric layer structure (120) has at least one recess (122) extending vertically through the photoimagable dielectric layer structure (120). The at least one recess (122) is formed by partially removing the photoimagable dielectric layer structure (120) in regions which are defined by a spatial pattern of an electrically conductive layer structure (130) being formed on the photoimagable dielectric layer structure (120). The spatial pattern comprises openings (132) formed within the electrically conductive layer structure (130). It is further described a method for manufacturing such a component carrier (100).