首页> 外国专利> PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING DIAPHRAGM, DIAPHRAGM STRUCTURE PRODUCED USING SAME, AND DISPLAY DEVICE INCLUDING DIAPHRAGM STRUCTURE

PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING DIAPHRAGM, DIAPHRAGM STRUCTURE PRODUCED USING SAME, AND DISPLAY DEVICE INCLUDING DIAPHRAGM STRUCTURE

机译:用于形成隔膜的光敏树脂组合物,使用相同产生的隔膜结构,以及包括隔膜结构的显示装置

摘要

The present invention provides: a photosensitive resin composition for forming a diaphragm; a diaphragm structure which is for a display device and produced from the photosensitive resin composition; and a display device including same. The photosensitive resin composition comprises an alkali-soluble resin, a polymerizable compound, a photo-initiator, and a solvent, and a cured film produced from the photosensitive resin composition has a transmittance of less than 5% at a wavelength of 450 nm, and a reflectance of 30% or more at a wavelength of 640 nm.
机译:本发明提供了一种用于形成隔膜的光敏树脂组合物; 用于显示装置并由光敏树脂组合物制造的隔膜结构; 和包括相同的显示设备。 光敏树脂组合物包含碱性树脂,可聚合化合物,光引发剂和溶剂,以及由光敏树脂组合物制备的固化膜的透射率小于450nm的波长,并且 波长为640nm的反射率为30%或更高。

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