首页> 外国专利> SUSCEPTOR ARRANGEMENT, MOCVD DEVICE INCLUDING THIS, AND CONTROL PROCEDURES FOR UNLOADING AN UPPER SUSCEPTOR FROM A MOCVD DEVICE

SUSCEPTOR ARRANGEMENT, MOCVD DEVICE INCLUDING THIS, AND CONTROL PROCEDURES FOR UNLOADING AN UPPER SUSCEPTOR FROM A MOCVD DEVICE

机译:基座布置,MOCVD装置包括这一点,以及从MOCVD设备卸载上部基座的控制程序

摘要

The present invention relates to a susceptor assembly and a MOCVD device comprising the same, in which a two-layer structure comprising an upper susceptor and a lower susceptor reduces a temperature deviation at a support surface. A susceptor assembly according to an embodiment of the present invention comprises: a upper susceptor having a support surface configured to be in contact with a substrate to support the substrate; and a lower susceptor configured to support the upper susceptor, the upper susceptor and lower susceptor being coated with different types of materials. The susceptor assembly and the MOCVD apparatus comprising it in accordance with the present invention reduce the non-uniformity of temperature at the support surface for supporting the substrate, thereby enabling a thin film to be grown with better uniformity on the substrate and obtaining a high yield in the manufacture of an element using the substrate grown by an MOCVD process.
机译:基座组件和包括该的MOCVD装置技术领域本发明涉及一种基座组件和包括该的MOCVD装置,其中包括上部基座和下部基座的双层结构降低了支撑表面的温度偏差。 根据本发明的实施例的基座组件包括:上部基座,其具有支撑表面,所述支撑表面构造成与基板接触以支撑基板; 和较低的基座,被配置为支持上部基座,上部基座和较低的基座被涂覆有不同类型的材料。 根据本发明的基座组件和包括其的MOCVD装置将用于支撑基板的支撑表面处的温度的不均匀性降低,从而使薄膜在基板上具有更好的均匀性并获得高收率 在使用MOCVD工艺生长的基材的制造中的制造。

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