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Streamlined GaN-based fabrication of light emitting diode structures

机译:流线型GaN的发光二极管结构的制造

摘要

Light Emitting Diodes (LEDs) made with GaN and related materials are used to realize high efficiency devices which emit visible radiation. These GaN-based LEDs consists of a multi-layer structure which include p-type electron confinement layers, and p-type current spreading and ohmic contacts layers located above the active region. The alignment of the etched features which penetrate near or through the active region and the ohmic contact is critical and is currently a technological challenge in the fabrication process. Any errors in this alignment and successive layers will short across the active layers of the device and result in reduced yield of functional devices. The invention described herein provides a method and apparatus to realize the successful alignment and streamlined fabrication of high-density LED array devices. The result is a higher pixel density GaN-based LED device with higher current handling capability resulting in a brighter device of the same area.
机译:用GaN和相关材料制造的发光二极管(LED)用于实现发射可见辐射的高效装置。 这些基于GaN的LED由多层结构组成,该结构包括P型电子限制层,并且位于有源区上方的P型电流扩展和欧姆触点层。 蚀刻特征的对准,其靠近或通过有源区和欧姆接触至关重要,并且是当前在制造过程中的技术挑战。 该对齐和连续层中的任何错误都将在设备的活动层上短路,并导致功能装置的收益率降低。 本文描述的本发明提供了一种实现高密度LED阵列装置的成功对准和流线型制造的方法和装置。 结果是具有较高电流处理能力的基于较高的像素密度GaN的LED器件,从而导致相同区域的更亮装置。

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