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GaN-Based Light Emitting Diode and Fabrication Method thereof

机译:GaN基发光二极管及其制造方法

摘要

PURPOSE: A GaN-based LED(Light Emitting Diode) and a fabricating method thereof are provided to distribute uniformly current by changing a structure of an electrode without using a transparent electrode. CONSTITUTION: An LED is formed by laminating sequentially a buffer layer(200), an n-type GaN membrane(300), a light emitting layer(400), a p-type GaN membrane(500), a p-type or an n-type electrode(600,700) on a surface of a sapphire substrate(100). The buffer layer(200) is used for heterogeneous junction for growing a GaN semiconductor on the surface of the sapphire substrate(100). The n-type and the p-type membranes(300,500) can be formed by AlGaN or InGaN as well as GaN. The n-type GaN membrane(300) has the first fingers and the second fingers. The first fingers are connected to each other. The second fingers are connected to each other. The second fingers are located at a place lower than the place of the first fingers.
机译:目的:提供一种基于GaN的LED(发光二极管)及其制造方法,以通过不使用透明电极而改变电极的结构来均匀地分配电流。组成:通过依次层压缓冲层(200),n型GaN膜(300),发光层(400),p型GaN膜(500),p型或p型GaN膜来形成LED蓝宝石衬底(100)的表面上的n型电极(600,700)。缓冲层(200)用于异质结,以在蓝宝石衬底(100)的表面上生长GaN半导体。 n型和p型膜(300,500)可以由AlGaN或InGaN以及GaN形成。 n型GaN膜(300)具有第一指和第二指。第一指彼此连接。第二指彼此连接。第二手指位于比第一手指的位置低的位置。

著录项

  • 公开/公告号KR100387099B1

    专利类型

  • 公开/公告日2003-06-12

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20010023653

  • 发明设计人 황현상;박성주;김현수;

    申请日2001-05-02

  • 分类号H01L33/00;

  • 国家 KR

  • 入库时间 2022-08-21 23:45:19

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