Atomic layer deposition process for producing a dielectric metasurface for wavelength of visible spectra

摘要

A method of manufacturing an optical component in the visible spectrum includes providing a substrate, forming a resist layer over the surface of the substrate, and patterning to define openings that expose portions of the surface of the substrate. Patterning the resist layer to form a resist layer; and depositing to form a dielectric thin film covering the patterned resist layer and covering the exposed portion of the surface of the substrate. Performing a step wherein the top surface of the dielectric thin film is above the top surface of the patterned resist layer; the top surface of the patterned resist layer; and the patterned resist layer. In order to expose the upper surface of the dielectric unit in the opening, a step of removing the upper portion of the dielectric thin film. When, and removing the patterned resist layer so as to retain said dielectric unit on the substrate.