首页> 外国专利> MICRO-NANO STRUCTURE ASSEMBLY MANUFACTURING METHOD AND MICRO-NANO STRUCTURE ASSEMBLY MANUFACTURED BY THE METHOD

MICRO-NANO STRUCTURE ASSEMBLY MANUFACTURING METHOD AND MICRO-NANO STRUCTURE ASSEMBLY MANUFACTURED BY THE METHOD

机译:通过该方法制造的微纳米结构组件制造方法和微纳米结构组件

摘要

The method for manufacturing the micro-nano structure assembly comprises: providing a filter membrane; providing an MEMS sensor, wherein the MEMS sensor is provided with an opening and can perform sensing through the opening; bonding the filter membrane to the MEMS sensor such that the filter membrane covers the opening. Providing the filter membrane comprises: heating a substrate (108) coated with a photoresist layer (106) to soften the photoresist layer (106) (202); pressurizing the substrate (108) with a mold, the mold consisting of a pattern layer (104) and a back layer (102) that are superimposed, wherein the back layer (102) being pressurized such that the pattern layer (104) contacts the photoresist layer (106) (204); cooling the photoresist layer (106) to solidify the photoresist layer (106) while continuously pressurizing the photoresist layer (106) with the mold, thereby forming a pattern conforming to the pattern layer (104) on the photoresist layer (106) (206); removing the mold, removing the photoresist remaining on the pattern by dry etching (208); depositing a filter membrane material (107) on the photoresist layer (106) (210); peeling off the photoresist layer (106) from the substrate (108) (212).
机译:用于制造微纳米结构组件的方法包括:提供过滤膜;提供MEMS传感器,其中MEMS传感器设置有开口并且可以通过开口进行感测;将过滤膜粘合到MEMS传感器,使得滤膜覆盖开口。提供过滤膜包括:加热涂有光致抗蚀剂层(106)的基板(108)以软化光致抗蚀剂层(106)(202);用模具加压基板(108),该模具由图案层(104)和叠加的背层(102)组成,其中所述背层(102)加压,使得图案层(104)接触光致抗蚀剂层(106)(204);冷却光致抗蚀剂层(106)以用模具连续地将光致抗蚀剂层(106)加压的光致抗蚀剂层(106)固化,从而在光致抗蚀剂层(106)(206)上形成符合图案层(104)的图案;去除模具,通过干法蚀刻去除残留在图案上的光致抗蚀剂(208);在光致抗蚀剂层(106)(210)上沉积滤膜材料(107);从基板(108)(212)上剥离光致抗蚀剂层(106)。

著录项

  • 公开/公告号WO2021082054A1

    专利类型

  • 公开/公告日2021-05-06

    原文格式PDF

  • 申请/专利权人 WEIFANG GOERTEK MICROELECTRONICS CO. LTD.;

    申请/专利号WO2019CN116568

  • 发明设计人 LIN YUJING;

    申请日2019-11-08

  • 分类号B81B7;B81B7/02;

  • 国家 CN

  • 入库时间 2022-08-24 18:37:20

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