OPC(Optical Proximity Correction) method using multi-OPC model, and methods for manufacturing mask using the OPC method

摘要

The technical idea of the present invention provides an OPC method using a multi-OPC model that can reduce the runtime of the entire OPC method by minimizing the repetition of simulation of a complex OPC model, and a mask manufacturing method using the OPC method. . The OPC method using the multi-OPC model includes performing an initial simulation using each of the first OPC model and the second OPC model for a target pattern; Calculating EPE_diff, which is a difference between a first EPE (Edge Placement Error) based on the first OPC model and a second EPE based on the second OPC model; Generating a re-target pattern using the EPE_diff; Performing a first simulation on the re-target pattern using a first OPC model; And performing a second simulation using a second OPC model based on the target pattern; wherein the first OPC model has an error tendency of the second OPC model and the number of kernel functions It is a model with minimized and computational area.