PROBLEM TO BE SOLVED: To provide a resist composition that does not cause residues and makes it possible to produce a resist pattern with excellent CD uniformity (CDU).SOLUTION: A resist composition comprises resin (A1) comprising a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator [where Rand Rare an alkyl group which may comprise a halogen atom, a hydrogen atom or a halogen atom; Ris a carboxy group, a cyano group or an aliphatic hydrocarbon group; Ais a single bond, *-A-O-, *-A-CO-O-, *-A-CO-O-A-CO-O-or the like; Aand Aare an alkanediyl group; w1 is an integer of 0-8: Lis a single bond or *-L-CO-O-(L-CO-O)-; Land Lare a divalent hydrocarbon group].SELECTED DRAWING: None
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