首页> 外国专利> A PROCESS AND APPARATUS FOR THE PREPARATION OF A BONDED SUBSTRATE

A PROCESS AND APPARATUS FOR THE PREPARATION OF A BONDED SUBSTRATE

机译:用于制备粘合基材的过程和装置

摘要

The present invention relates to a process and apparatus for the preparation of a bonded substrate. More particularly, the present invention relates to a PDMS bonding apparatus. More specifically, the present invention relates to a PDMS bonding apparatus which uses plasma to bond PDMS to a substrate. The present invention discloses a PDMS bonding apparatus and process for using said apparatus, the apparatus comprising : a process chamber (100) forming a sealed processing space (S) for bonding of PDMS (polydimethylsiloxane); a first support (200) installed in the process chamber (100) and which supports the PDMS (1); a second support (300) installed in the process chamber (100) opposing the first support (200) and which supports a bonding object (2) which is bonded to the PDMS (1); a gas injection unit (400) which ejects process gas between the first support (200) and the second support (300), and; a plasma generator (500) which creates a plasma atmosphere within the process chamber (100).
机译:本发明涉及用于制备粘合基材的方法和装置。更具体地,本发明涉及PDMS粘合装置。更具体地,本发明涉及一种PDMS粘合装置,其使用等离子体将PDM粘合到基板上。本发明公开了一种用于使用所述装置的PDMS粘合装置和方法,该装置包括:处理室(100),其形成密封的处理空间,用于粘合PDMS(聚二甲基硅氧烷);在处理室(100)中安装的第一支撑件(200),其支持PDMS(1);安装在与第一支撑件(200)相对的处理室(100)中的第二支撑(300),并且支撑粘合物(2),该接合物(2)粘合到PDMS(1);一种气体喷射单元(400),其在第一支撑件(200)和第二支撑件(300)之间弹出工艺气体,以及;等离子体发生器(500),其在处理室(100)内产生等离子体大气。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号