System and method for inhibiting VUV radiation radiation of laser sustaining plasma source

摘要

A laser sustaining plasma formation system, wherein the gas containment element, the illumination source configured to produce pump illumination, and the pump illumination from the pumping source are focused into the gas mixture mass by focusing into the gas mixture mass. And a focusing element configured to generate a plasma and cause the plasma to emit broadband radiation. The gas containment element may be configured to contain a gas mixture mass containing the first gas component and the second gas component. At least one of the first gas component related portion of the broad band radiation and the radiation by the one or more first gas component related excimers of the spectrum of the radiation intended to leave the gas mixture is the second It is suppressed by the gas component.