System and method for inhibiting VUV radiation emission of laser-sustained plasma source

摘要

A system for forming a laser-sustained plasma comprises: a gas containment element; An illumination source configured to generate pump illumination; And a collector element configured to focus pump illumination from the pumping source into the volume of the gas mixture to create a plasma within the volume of the gas mixture emitting broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture comprising a first gas component and a second gas component. The second gaseous component inhibits at least one of a portion of the broadband radiation associated with the first gaseous component or radiation by one or more excimers associated with the first gaseous component from the spectrum of radiation exiting the gaseous mixture.