Systems and methods for inhibiting VUV radiation emission of laser-continuous plasma sources

摘要

A system for forming a laser-sustained plasma includes: a gas containment element; An illumination source configured to generate a pump illumination; And a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture to produce a plasma within the volume of the gas mixture that emits the broadband radiation. The gas containment element may be configured to include a volume of a gas mixture comprising a first gas component and a second gas component. The second gaseous component suppresses at least one of the broadband radiation associated with the first gaseous component or the radiation by the at least one excimer associated with the first gaseous component from the spectrum of radiation exiting the gas mixture.