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Valve device, fluid control device, fluid control method, semiconductor manufacturing device and semiconductor manufacturing method

机译:阀装置,流体控制装置,流体控制方法,半导体制造装置和半导体制造方法

摘要

A valve device capable of controlling a large flow rate more stably while improving sealing performance and miniaturization is provided. The valve body 2, the tubular member 3 provided in the receiving recess 23 and communicating with the first flow path 21, the valve seat 48 supported by the tubular member 3, and accommodation The sealing member 49 interposed between the opening of the first flow path 21 on the bottom of the concave portion 23 and the lower end of the tubular member 3, and the receiving concave portion 23 of the valve body 2 A plurality that is airtightly or liquid-tightly fixed to the annular support 24 formed on the inner circumferential surface, and airtightly or liquid-tightly fixed to the annular support 37 formed on the outer circumferential surface of the cylindrical member 3, and communicates with the second flow path 22 By moving between the flexible annular plate 11 having an opening of the valve seat 48 and an open position and a closed position in contact with the valve seat 48, the first flow path 21 and the second flow path ( It has a diaphragm 41 for communicating and blocking 22).
机译:提供了一种能够更稳定地控制大流速同时提高密封性能和小型化的阀装置。阀体2,设置在接收凹槽23中的管状构件3并与第一流动路径21连通,由管状构件3支撑的阀座48,以及插入在第一流动路径的开口之间的容纳件49 21在凹部23的底部和管状构件3的下端,以及阀体2的接收凹部23,多个通气或液密地固定到形成在内圆周上的环形支撑件24表面,并且通过气密或液密地固定到形成在圆柱形构件3的外周表面上的环形支撑件37,并通过在具有阀座48的开口的柔性环形板11之间移动来与第二流动路径22连通和与阀座48接触的打开位置和闭合位置,第一流动路径21和第二流动路径(它具有用于连通和阻挡22的隔膜41)。

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