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charge coupled devices impieganti concentrations not uniform of office building along the channel of information

机译:电荷耦合器件沿信息通道的办公楼集中度不均匀

摘要

1376640 Semi-conductor devices WESTERN ELECTRIC CO Inc 27 June 1972 [28 June 1971 (2)] 30046/72 Heading H1K A charge coupled device comprises an electrode arrangement, on an insulating layer, over a charge carrier storage medium, fixed charges being distributed beneath the electrode arrangement to form an asymmetric well during operation. The fixed charge may reside in the medium, the insulating layer or both, and may be produced by diffusion or ion implantation. In one embodiment, Figs. 1, 2 (not shown), a two-phase system has chargers fixed in the medium and distributed non-uniformly so as to form potential barriers to charge carriers in the "upstream" direction. In a second embodiment, Fig. 6, the fixed charges reside, non-uniformly, in the insulating layer, again forming potential barriers in the "upstream" direction. The use of two value clock pulses enables a single row of electrodes to be used, the first pulse to all electrodes being of a low value to form shallow potential wells beneath the electrodes enabling carriers to transfer to deeper wells beneath the interelectrode spaces, the second pulse being of a greater value to form deep wells beneath the electrodes and receive carriers, in one direction only, from the shallower inter-electrode wells. In a further embodiment, the electrodes may be mounted on insulating material of irregular thickness to assist in the formation of suitably asymmetric wells. In Fig. 12 (not shown), a single electrode extends over insulating material of irregular thickness, the material containing a non-uniform distribution of fixed charge, a two-value clock pulse enabling charge transfer by means of wells of different depths beneath different parts of the electrode. The medium may be of silicon, the insulating layer of silicon dioxide.
机译:1376640半导体装置WESTERN ELECTRIC CO Inc 1972年6月27日[1971年6月28日(2)] 30046/72标题H1K电荷耦合装置包括位于绝缘层上,位于电荷载流子存储介质上的电极装置,固定电荷分布在操作期间电极结构下方形成非对称阱。固定电荷可以驻留在介质,绝缘层或两者中,并且可以通过扩散或离子注入产生。在一个实施例中,图1至图4示出了图1的实施例。参照图1、2(未示出),两相系统具有固定在介质中并且分布不均匀的充电器,从而形成对“上游”方向上的电荷载流子的势垒。在图6的第二实施例中,固定电荷不均匀地驻留在绝缘层中,再次在“上游”方向上形成势垒。使用两个值的时钟脉冲可使用单行电极,对所有电极的第一个脉冲为低值,可在电极下方形成浅势阱,使载流子可转移至电极间空间下方的较深阱,第二个脉冲具有更大的价值,以在电极下方形成深阱并仅从一个较浅的电极间阱沿一个方向接收载流子。在另一个实施例中,电极可以安装在不规则厚度的绝缘材料上,以帮助形成适当的不对称阱。在图12(未显示)中,单个电极在不规则厚度的绝缘材料上延伸,该材料包含不均匀分布的固定电荷,两个值的时钟脉冲使电荷能够通过不同深度下的不同深度的阱进行转移电极的一部分。介质可以是硅,二氧化硅是绝缘层。

著录项

  • 公开/公告号JPS5147586B1

    专利类型

  • 公开/公告日1976-12-15

    原文格式PDF

  • 申请/专利权人

    申请/专利号JP19720064167

  • 发明设计人

    申请日1972-06-28

  • 分类号H01L29/40;H01L29/78;G11C11/34;G11C19/28;

  • 国家 JP

  • 入库时间 2022-08-23 01:02:46

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