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Method of selective etching of materials utilizing masks of binary silicate glasses
Method of selective etching of materials utilizing masks of binary silicate glasses
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机译:利用二元硅酸盐玻璃掩模选择性刻蚀材料的方法
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摘要
A method of etching a layer of material on the surface of a substrate of silicon dioxide utilizes an etch mask constituted of a binary silicate glass. The binary silicate glass is removed subsequent to the etching of the layer without affecting the substrate of silicon dioxide.
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