首页> 外国专利> FLOW RATE CONTROLLABLE METAL VAPOR SOURCE AND ION ANALYZER EQUIPPED WITH SUCH SOURCE

FLOW RATE CONTROLLABLE METAL VAPOR SOURCE AND ION ANALYZER EQUIPPED WITH SUCH SOURCE

机译:配备这种源的流速可控金属蒸气源和离子分析仪

摘要

A metal vapor source with a regulatable flow rate comprising an enclosure filled with said vapor, means for heating said enclosure to a first temperature, a tube connected to the enclosure and means for heating said tube to a second regulatable temperature, the first temperature being maintained above the second temperature. An ion analyzer comprising an enclosure in which is disposed a target to be analyzed, a lens for extracting secondary ions whose front face faces the target, an enclosure filled with an alkaline vapor, means for heating said enclosure to a first regulatable temperature, a vapor outflow tube connected to one end of the enclosure, while the other end penetrates the analyzer enclosure, traverses the extraction lens and assumes a position level with the front face of the extraction lens and means for heating said tube to a second regulatable temperature, the first temperature being kept above the second temperature of the outflow tube.
机译:一种具有可调节流量的金属蒸气源,包括充满所述蒸气的外壳,用于将所述外壳加热到第一温度的装置,连接到所述外壳的管以及用于将所述管加热到第二可调节温度的装置,保持第一温度高于第二温度。一种离子分析仪,包括:外壳,在该外壳中设置有待分析的靶标;用于提取二次离子的透镜,其前表面面对该靶标;一个装有碱性蒸气的外壳;将所述外壳加热至第一可调节温度的装置;一种蒸气。流出管连接到外壳的一端,而另一端穿过分析仪外壳,穿过抽气透镜,并与抽气透镜的前表面和用于将所述管加热到第二可调节温度的装置保持在同一位置,第一温度保持在流出管的第二温度以上。

著录项

  • 公开/公告号JPS5476288A

    专利类型

  • 公开/公告日1979-06-18

    原文格式PDF

  • 申请/专利权人 COMMISSARIAT ENERGIE ATOMIQUE;

    申请/专利号JP19780138970

  • 发明设计人 PATORITSUKU KARIEERU;BURUNO BURANCHIYAARU;

    申请日1978-11-13

  • 分类号G01N23/225;H01J37/252;H01J37/30;H01J49/04;H01J49/14;

  • 国家 JP

  • 入库时间 2022-08-22 21:14:47

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