首页> 外国专利> FET esp. metal-semiconductor FET - has two gate electrodes both controlling source-drain current in gallium arsenide substrate

FET esp. metal-semiconductor FET - has two gate electrodes both controlling source-drain current in gallium arsenide substrate

机译:场效应管金属半导体FET-具有两个栅电极,两个栅电极均控制砷化镓衬底中的源极-漏极电流

摘要

The field effect transistor has an s-c substrate with a source electrode and a drain electrode inside a substrate zone and at least two gate electrodes each controlling the current flowing between the source and drain electrodes. The FET may be a metal-semiconductor FET, in which case each gate electrode forms a Schottky junction contact in the substrate zone. The substrate is pref. of gallium arsenide. The two gate electrodes are arranged so that they control all the current flowing between source and drain.
机译:场效应晶体管具有在衬底区域内部具有源电极和漏电极的s-c衬底以及至少两个栅电极,每个栅电极控制在源电极和漏电极之间流动的电流。该FET可以是金属半导体FET,在这种情况下,每个栅电极在衬底区域中形成肖特基结接触。基材是优选的。砷化镓。布置两个栅电极,以便它们控制在源极和漏极之间流动的所有电流。

著录项

  • 公开/公告号DE2836268A1

    专利类型

  • 公开/公告日1979-03-01

    原文格式PDF

  • 申请/专利权人 PLESSEY HANDEL UND INVESTMENTS AG;

    申请/专利号DE19782836268

  • 发明设计人 ANDREW SLAYMAKERNICHOLAS;

    申请日1978-08-18

  • 分类号H01L29/76;

  • 国家 DE

  • 入库时间 2022-08-22 19:44:19

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号