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Thyristor with differently doped base layers - has specified mean impurities concentration in higher doped base layer and matrix of shunt channels of specified width
Thyristor with differently doped base layers - has specified mean impurities concentration in higher doped base layer and matrix of shunt channels of specified width
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机译:具有不同掺杂基极层的晶闸管-在较高掺杂基极层和指定宽度的分流通道矩阵中具有指定的平均杂质浓度
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摘要
One of the thyristors base layer is of p-conductivity and highly doped, while the other base layer is of n-conductivity and lowly doped. The layers are arranged between n- and p-conductivity emitter layers. From the p-conductivity base layer to the current terminal contact extend shunting channels (10) for shunting the emitter junction. The mean concentration of impurities in the highly doped base layer (2) has a max. value of 1 x 1016 cm-3. The shunting channels form a network in which the width of each channel does not exceed the diffusion length of the carrier in the highly doped base layer. Pref. the channels are arranged in the highly doped base layer in a depth corresponding to the impurity concentration of max. 1 x 1015 cm-3, and the spacing of the channels is specified.
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机译:晶闸管基极层中的一个基层具有p导电性和高掺杂,而另一基层具有n导电性并且具有低掺杂。这些层布置在n和p导电发射极层之间。从p导电基极层到电流端子触点,延伸用于将发射极结旁路的旁路通道(10)。高掺杂基层(2)中杂质的平均浓度最大。值1 x 1016 cm-3。分流通道形成网络,其中每个通道的宽度不超过高掺杂基层中载流子的扩散长度。首选沟道以对应于最大杂质浓度的深度布置在高掺杂基极层中。 1 x 1015 cm-3,并指定了通道间距。
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