首页> 外国专利> Jig for rotating substrate holders in vapour deposition plants - where each holder is rotated through an arc via spring:loaded lever

Jig for rotating substrate holders in vapour deposition plants - where each holder is rotated through an arc via spring:loaded lever

机译:用于在气相沉积设备中旋转基板支架的夹具-每个支架通过弹簧:加载杆旋转通过弧线

摘要

In the plant is a rotating turntable fitted on its top rim with a circular row of horizontal pivot shafts (4). Each shaft (4) carries a roller (11) to which a substrate holder is fixed; and roller (11) can be rotated through an arc of e.g. 180 deg. by the curved end of a lever (5) mounted on a horizontal pivot shaft (6). A circular row of shafts (6), each carrying a lever (5), is located round the turntable. At the bottom end of each lever (5) is a pivot shaft (15) carrying an adjustable lever (14). When the lower end of lever (14) meets a limit stop (21) due to the rotation of the turntable, lever (5) moves through an arc, thus rotating roller (11) and the substrate holder. Both sides of a substrate can be exposed to the vapour, or two substrates can be mounted back to back for increased output when only one side of each substrate is to be coated.
机译:在工厂中,有一个旋转的转盘,其顶部边缘装有一排水平的水平枢轴(4)。每个轴(4)带有一个辊(11),衬底支架固定在该辊上。辊(11)可以旋转例如弧度。 180度通过安装在水平枢轴(6)上的杠杆(5)的弯曲端部。一排圆形的轴(6)分别位于转盘周围,每个轴上都带有一个杠杆(5)。每个杠杆(5)的底端是一根枢轴(15),上面装有可调杠杆(14)。当杠杆(14)的下端由于转盘的旋转而与限位挡块(21)相遇时,杠杆(5)会通过弧形运动,从而使滚筒(11)和基板支架旋转。基板的两面都可以暴露于蒸气中,或者当每个基板的一面仅要涂布时,可以背对背安装两个基板以增加输出。

著录项

  • 公开/公告号DE2951465A1

    专利类型

  • 公开/公告日1981-07-02

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE19792951465

  • 发明设计人 BIBERACHERLUDWIG;

    申请日1979-12-20

  • 分类号C23C13/08;C23C13/00;

  • 国家 DE

  • 入库时间 2022-08-22 15:13:24

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