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COATING OF TI, ZR AND HF COMPOUNDS BY CATHODIC SPUTTERING IN A PULSED REACTIVE GAS
COATING OF TI, ZR AND HF COMPOUNDS BY CATHODIC SPUTTERING IN A PULSED REACTIVE GAS
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机译:脉冲反应气中阴极溅射法涂覆TI,ZR和HF化合物
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摘要
A method of reactive sputtering of the nitride, oxide or carbide of titanium or similar materials onto a substrate from a target of the pure metal in a chamber utilizing an inert gas, such as argon, wherein the deposition rate of the metallic compound approaches substantially the deposition rate of the pure metal. A reactive gas is introduced into the chamber adjacent to the target at a constant flow and by a rapid pulsing wherein a valve is alternately opened and shut for very short time intervals.
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