METHOD OF DECIDING AZIMUTH OF (100)INP SUBSTRATE WAFER

摘要

A method for determining crystallographic orientation of an InP substrate wafer includes the steps of immersing at least a portion of the substrate wafer in a chemical etchant for a predetermined amount of time to expose features having a predetermined shape and designating a particular crystallographic direction on the substrate wafer in accordance with relative positions of features on the portion of the substrate wafer.