Apparatus for measuring the contact resistance of electrolytically applied surface films

摘要

A method and device is disclosed for the measurement of contact resistances of galvanic surfaces. Such contact resistances are subject to very great fluctuations. In order to measure the contact resistance, several wire pieces are provided with the galvanic surface. These wire pieces are stacked crosswise over one another and are pressed against one another with a defined pressure. The total resistance is measured between the uppermost and lowermost wire piece, and this total resistance is then divided by the number of points of contact.