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Mask for copying a pattern onto a photoresist layer, process for the production of this mask, and its use in a photolithographic process
Mask for copying a pattern onto a photoresist layer, process for the production of this mask, and its use in a photolithographic process
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机译:用于将图案复制到光刻胶层上的掩模,该掩模的生产工艺及其在光刻工艺中的用途
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摘要
the invention relates to a mask for the image of a pattern on a photoresistschicht with at least one justiermarke,a process for the production of such a mask, and use of these masks for the manufactur
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