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Laser-enhanced jet-plating and jet-etching: high-speed maskless patterning method

机译:激光增强的喷镀和蚀刻:高速无掩模构图方法

摘要

This metal deposition/material removal technique modifies free- standing or submerged jet plating with an electromagnetic energy beam such as an intense laser beam, directed collinearly along the jet. Experiments were made to deposit gold contact areas on nickel plated beryllium-copper substrates used for microelectronic connectors. The deposits are found to be crack-free and dense, possessing excellent adhesion to the substrate. Deposition rates for 0.05 cm diameter gold spots are on the order of 10 micrometers per second.
机译:这种金属沉积/材料去除技术利用电磁能束(例如强烈的激光束)沿射流共线定向,对自立式或浸没式喷镀进行了改进。进行了将金接触区域沉积在用于微电子连接器的镀镍铍铜基板上的实验。发现沉积物是无裂纹且致密的,对基材具有优异的粘合力。直径为0.05厘米的金斑的沉积速率约为10微米/秒。

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