MASKLESS PATTERN GENERATION SYSTEM AND METHOD OF GENERATING MASKLESS PATTERN

摘要

PPROBLEM TO BE SOLVED: To provide a maskless pattern generation system for directly writing a pattern in a substrate, which has no fault relevant to a reticle system and well-known light valve. PSOLUTION: The maskless pattern generation system is provided with: an optical source 202 which generates light beam 204; a programable pattern generator 206 which forms a pattern from the light beam 204, based on a control signal 208 input which commands the programable pattern generator 206 to set individual voltage levels corresponding to individual pixels in a pixel array, wherein individual voltage levels correspond to gray scale levels assigned to specific one of individual pixels, respectively; and a control unit 210 which supplies the control signal input to the programable pattern generator 206, based on a pattern information 114 supplied. PCOPYRIGHT: (C)2005,JPO&NCIPI