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ZIRCONIUM OXIDE COMPOSITION FOR VAPOR DEPOSITION AND SPUTTERING AND PRODUCTION OF OPTICAL THIN FILM USING SAID COMPOSITION
ZIRCONIUM OXIDE COMPOSITION FOR VAPOR DEPOSITION AND SPUTTERING AND PRODUCTION OF OPTICAL THIN FILM USING SAID COMPOSITION
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机译:用于气相沉积和溅射的氧化锆组合物以及使用所述组合物制备光学薄膜的方法
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摘要
PURPOSE:To suppress optical heterogeneity and to improve hardness by using a compsn. consisting of zorconium oxide as well as yttrium oxide and titanium oxide for an evaporating source or sputtering source. CONSTITUTION:A compsn. consisting of zirconium oxide, 0.5-50wt% yttrium oxide by the weight of said zirconium and 0.5-160wt% titanium oxide is used for an evaporating source or sputtering source and a thin film is formed on the surface of a base body by vacuum evaporation or sputtering.
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