- - ZIRCONIUM-CONTAINING FILM FORMING COMPOSITIONS FOR VAPOR DEPOSITION OF ZIRCONIUM-CONTAINING FILMS

摘要

A zirconium-containing film-forming composition comprising a germanium- and zirconium-containing precursor having one of the following formulas is disclosed. Also disclosed are methods of synthesizing the disclosed compositions and methods of using them to deposit a zirconium-containing film on a substrate via a vapor deposition process: (I) RTI ID = 0.0 & Wherein each of R ¹ , R ² , R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ⁸ , R ⁹ and R ¹⁰ is independently H; C ₁ -C ₅ linear, branched, or cyclic alkyl groups; And a C ₁ -C ₅ linear, branched, or cyclic fluoroalkyl group.