arrangement for measuring electrical resistance and temperature of nanoseconds or aufstaeuben on isolated thin metallic substrates during the schichtherstellung conductive layers.

摘要

A system for measuring electrical resistance and temperature during the manufacture of thin, conductive films deposited on substrates by means of evaporation or sputter-deposition. A deposition unit with an evacuatable load lock chamber and a rotating substrate holder are employed as the deposition system. The specific electrical resistance of the film is measured according to the principle of the two-point or four-point measuring methods at a reference substrate with specific sample geometry and with low-resistance contacts. The substrate temperature is measured by means of resistance thermometers. With the invention, the transmission of the measured data occurs contact-free by means of electro-magnetic radiation, preferably by means of a telemetric pulse code modulation method.