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Epitaxial indium-gallium-arsenide phosphide layer on lattice- matched indium-phosphide substrate and devices

机译:晶格匹配的磷化铟衬底上的外延磷化铟镓砷化物层和器件

摘要

An epitaxial layer of a quaternary III-V alloy of Ga, In, As, and P has its constituents proportioned for lattice matching to a substrate having a lattice constant falling within the range of 5.45 to 6. 05 A. In addition, the constituents of the alloy are proportioned to provide a selected bandgap energy falling within the range of 2.23 to 0. 35 electron volts; this corresponds to wavelengths of 0.55 to 3.5 microns. Near perfect lattice matched heterojunctions are provided between the epitaxial layer and the lattice matched substrate; these are useful for providing improved photocathodes and lasers, particularly in the infrared range of wavelengths between 0.8 and 2.0 microns.
机译:Ga,In,As和P的四元III-V合金的外延层具有与晶格常数落在5.45至6. 05 A范围内的基板成比例地与晶格匹配的成分。按比例调整合金的比例以提供落在2.23至0. 35电子伏特范围内的选定带隙能量;这对应于0.55至3.5微米的波长。在外延层和晶格匹配的衬底之间提供接近完美的晶格匹配的异质结。这些可用于提供改进的光电阴极和激光器,特别是在波长在0.8到2.0微米之间的红外范围内。

著录项

  • 公开/公告号US3982261B1

    专利类型

  • 公开/公告日1987-04-07

    原文格式PDF

  • 申请/专利权人

    申请/专利号US19740496487

  • 发明设计人

    申请日1974-08-12

  • 分类号H01L29/205;H01L31/00;H01S31/19;

  • 国家 US

  • 入库时间 2022-08-22 07:10:01

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