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Method of performing solution growth of a GaAs compound semiconductor crystal layer under control of conductivity type thereof
Method of performing solution growth of a GaAs compound semiconductor crystal layer under control of conductivity type thereof
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机译:在GaAs化合物半导体晶体层的导电类型控制下进行溶液生长的方法
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摘要
In a solution growth method to perform an epitaxial growth by doping an amphoteric impurity into a Group III-V compound semiconductor crystal, vapor of a crystal-constituting Group V element is supplied to the solution, during the growth process, from above this solution under a controlled vapor pressure, while maintaining the growth temperature at a constant value by relying on, for example, a temperature difference technique, whereby the conductivity type in the grown crystal layer can be controlled easily as desired, and also a pn junction can be conveniently formed in the grown crystal.
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