首页> 外国专利> Evaporator for vacuum deposition of films - has means for forming directed flow of deposition material vapour from crucible up to substrate

Evaporator for vacuum deposition of films - has means for forming directed flow of deposition material vapour from crucible up to substrate

机译:用于薄膜真空沉积的蒸发器-具有用于形成沉积材料蒸气从坩埚到基底的定向流的装置

摘要

The evaporator consists of a crucible for the deposition material equipped with a heater and connected with a pipe to produce an updraught. The pipe has a transverse symmetry plane and has one end fitted in the crucible. It directs the flow of vapour to a substrate.
机译:蒸发器由用于沉积材料的坩埚组成,该坩埚配备有加热器,并与管道相连以产生抽气。该管具有横向对称平面,并且一端安装在坩埚中。它将蒸气流引导至基材。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号