首页> 外国专利> METHOD FOR FORMING ON A SUBSTRATE A LAYER OF SEMICONDUCTOR MATERIAL BASED ON GROUP II AND VI ELEMENTS

METHOD FOR FORMING ON A SUBSTRATE A LAYER OF SEMICONDUCTOR MATERIAL BASED ON GROUP II AND VI ELEMENTS

机译:基于第II族和第VI族元素的半导体材料基层形成方法

摘要

THE PRESENT INVENTION RELATES TO A METHOD OF FORMING A LAYER 12 COMPRISING A MATERIAL WITH ELEMENTS OF GROUPS II AND VI ON A SUBSTRATE 11, CHARACTERIZED IN THAT IT INCLUDES THE STEPS CONSISTING OF: / P P -A DIRECTING A CURRENT COMPRISING AT LEAST ONE DERIVED FROM A GROUP II ELEMENT TO THE SUBSTRATE; / P P - DIRECTING A CURRENT ORGANIC DERIVATIVE FROM A GROUP VI ELEMENT TO THE SUBSTRATE, SAID ORGANIC DERIVATIVE COMPRISING AT LEAST ONE ORGANIC GROUP HAVING ACTIVATION ENERGY FOR THE FORMATION OF A FREE RADICAL BY DISSOCIATION OF THE GROUP OF THE VII GROUP ELEMENT THAT IS LESS THAN ACTIVATION ENERGY DERIVED FROM THE PRIMARY ALKYL GROUP OF THE GROUP ELEMENT VI .
机译:本发明涉及一种在基板11上形成包括具有第二和第六族元素的材料的层12的方法,其特征在于包括以下步骤:

-指示当前包含至少从第二组元素派生到基板;

-从基团VI元素中选择一种当前的有机衍生物,并将其归因于至少一个有机基团的基质,所述的有机衍生物,其具有活化能以通过解离第VII族的基团形成自由基比元素VI的原始烷基衍生的活化能低的元素。

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