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METHOD AND DEVICE FOR CLEANING BOTH SIDES OF SUBSTRATE USING ULTRASONIC CLEANING SPRAY NOZZLE

机译:超声波清洗喷雾喷嘴清洗基材两面的方法和装置

摘要

PURPOSE:To enable foreign contaminative objects adheres to the surface of a substrate to be cleaned to be removed efficiently by centrally spraying cleaning liquid, where ultrasonic vibration is propagated with a sharp angle to a substrate surface against the direction of revolution, to both sides of the substrate while rotating the substrate to be cleaned. CONSTITUTION:Supporting means for supporting a substrate to be cleaned 1 with at least three fixing tools 3 so that they can rotate, means where at least one ultrasonic cleaning spray nozzle 5 is opposed to both surfaces of the substrate 1 with a sharp slope to the rotary surface of the substrate 1, and means for scanning a ultrasonic cleaning spray nozzle 5 in radius direction of the rotary substrate are provided. Then, the plate-like substrate to be cleaned 1 is rotated and washing liquid is centrally sprayed while rotating it in radius direction of the rotary central axis of the substrate. It allows contaminated foreign objects on both surfaces of the substrate to be cleaned to be eliminated simultaneously in a short time and with improved efficiency.
机译:用途:为了使异物附着在要清洁的基材表面上,可以通过集中喷洒清洁液有效地去除,在该处,超声波振动会沿旋转方向以锐角传播到基材表面,并向基材的两侧传播。旋转要清洁的基板时,请旋转基板。组成:用至少三个固定工具3支撑被清洁衬底1以便旋转的支撑装置,其中至少一个超声波清洁喷嘴5与衬底1的两个表面相对,并相对于衬底1呈锐角倾斜设置有基板1的旋转面以及在旋转基板的半径方向上扫描超声波清洗喷嘴5的机构。然后,旋转待清洗的板状基板1,并且在沿基板的旋转中心轴的半径方向旋转的同时,向中央喷射清洗液。这允许在短时间内同时并以提高的效率同时消除要清洁的衬底两个表面上的污染的异物。

著录项

  • 公开/公告号JPH01259536A

    专利类型

  • 公开/公告日1989-10-17

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;

    申请/专利号JP19880087382

  • 发明设计人 HAGIMAE HIROAKI;OTAKE MITSUYOSHI;

    申请日1988-04-11

  • 分类号B08B3/02;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 06:46:59

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