Wet etching process for making a surface grating having a specified operating constant on the surface of a substrate of a semiconductor material

摘要

Wet etch process is used to manufacture a surface grid (1), has the specified grating constant (a) on the surface of semiconductor crystal (3). Object is able to give production surface grid in the regions submicrometre with for distributed feedback laser or other integrated optical structures without a sufficient ripple's depth of a mask. One preliminary surface grinds (4) with specified grating constant (a) but is produced without a mask on the surface (2) of crystal (3) with relatively small ripple using such as laser etching. In order to manufacture actual surface grid (1), preliminary surface grid (1) is retained the additional time do not illuminated and specified for one in the corrosive agent anisotropically acted on behalf of in dark.image