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Method for obtaining submicron features from optical lithography technology
Method for obtaining submicron features from optical lithography technology
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机译:通过光刻技术获得亚微米特征的方法
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摘要
A method for the construction of submicron features using optical lithography technology. A material is deposited on a surface to be etched, this material is partially etched through using optical lithography technology. Sidewalls are deposited to reduce the size of this etched area to the submicron size desired. The etch of the layer is then completed resulting in a submicron mask for the substrate below.
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