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Infrared detector system based upon group III-V epitaxial material

机译:基于III-V族外延材料的红外探测器系统

摘要

The disclosure relates to a detector of infrared radiation which employs Group III-V compound semiconductor technology and includes a conductive substrate, of a material such as GaAs. Upon this substrate is deposited a lattice structure, including thin alternating layers of a wider and a narrower energy band gap material (AlGaAs and GaAs) periodically disposed. Upon this is deposited a layer of an alloyed semiconductor of moderate bandgap, into which photoexcited carriers are injected, and upon this is deposited a layer of wider bandgap material against which the carriers are trapped and thus collected. The lattice is designed so that the energy gap between the first two bands produced by the periodic structure is equal to the infrared photon energy. The doping is such as to nearly fill the first band with free carriers. Thus infrared radiation is efficiently absorbed, generating free carriers in the second band of the lattice. The bandgap of the next layer is chosen so that these photoexcited carriers may easily pass into this layer, while those in the lower-energy band are blocked. These carriers are propelled across this next layer by an applied electric field and are collected at the interface with a wide-gap layer.
机译:本公开涉及一种红外辐射检测器,其采用III-V族化合物半导体技术,并且包括诸如GaAs的材料的导电衬底。在该衬底上沉积晶格结构,该晶格结构包括周期性地设置的较宽和较窄的能带隙材料(AlGaAs和GaAs)的薄交替层。在其上沉积一层中等带隙的合金半导体层,向其中注入光激发载流子,并在其上沉积一层较宽的带隙材料,载流子被俘获并因此被收集。设计晶格,使得由周期性结构产生的前两个带之间的能隙等于红外光子能量。掺杂使得自由载流子几乎充满了第一频带。因此,红外辐射被有效吸收,在晶格的第二带中生成自由载流子。选择下一层的带隙,以便这些光激发的载流子可以轻松进入该层,而低能带中的载流子被阻挡。这些载流子被施加的电场推动而跨过下一层,并在与宽间隙层的界面处被收集。

著录项

  • 公开/公告号US4803537A

    专利类型

  • 公开/公告日1989-02-07

    原文格式PDF

  • 申请/专利权人 TEXAS INSTRUMENTS INCORPORATED;

    申请/专利号US19880170604

  • 发明设计人 ADAM J. LEWIS;WILLIAM R. FRENSLEY;

    申请日1988-03-14

  • 分类号H01L27/14;H01L31/00;

  • 国家 US

  • 入库时间 2022-08-22 06:28:35

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