MOLECULAR BEAM EPITAXIAL DEVICE AND MOLECULAR BEAM EPITAXIAL METHOD AND MOLECULAR BEAM CELL

摘要

PURPOSE:To easily and automatically obtain a desired molecular beam intensity by inputting the output of a vacuum gage which measures the vacuum degree near a substrate and the outputs of temp. measuring means which measure the temp. of molecular beam cells to a control device and controlling the operations of heating means and shutters for the cell by the control device. CONSTITUTION:A substrate holder 4 and the vacuum gage 3 for measuring the molecular beam intensity are provided to face each other in a vacuum chamber 2 and further, the molecular beam cells 6, 8, 10, etc., are disposed. The shutters 7, 9, 11 are provided to the respective cells. The vacuum degree near the substrate is measured by the vacuum gage 3. The measured value thereof and the measured values obtd. by measuring the temps. of the molecular beam cells 6, 8, 10 are inputted to the control device 12. The values are compared with the previously inputted set values by the control device 12 and the heating means of the molecular beam cells 6, 8, 10 and the opening/closing operations of the shutters 7, 9, 11 are controlled in such a manner that said values coincide with the set values. The desired molecular beam intensity and molecular beam intensity ratio are thereby obtd.