NOVOLAK RESIN, RADIATION-SENSITIVE POSITIVE PHOTORESIST, AND METHOD FOR FORMING RESIST PATTERN

摘要

Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations in combination with a photosensitizer such as a naphthoquinone sensitizer.