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The composition reveals to reveal cladding welding mask, concentrate composition and process for coating reveals reveal not exposed solder mask

机译:成分显示显露熔覆焊接面罩,浓缩液成分和涂覆工艺显示显露未暴露的阻焊层

摘要

The present specification describes an aqueous developer composition which can develop solvent developable photosensitive materials and comprises a surfactant, a terpene and water, in defined proportions. In a preferred form, the composition includes about 0.5-10% by wt. of a surfactant, and about 0.2-10% by wt. of a terpene, the rest being water. Most preferably, the composition comprises about 3-6% by wt. of a surfactant, and about 4-8% by wt. of a terpene, the rest being water. The surfactant is preferably a non-ionic surfactant or mixture thereof, and the terpene is d-limonene. A concentrate formulation also is provided herein from which the aqueous developer composition may be made by dilution with water, usually in an amount of about five to ten times of the concentrate.
机译:本说明书描述了一种水性显影剂组合物,其可以使溶剂可显影的光敏材料显影并且以限定的比例包含表面活性剂,萜烯和水。在优选的形式中,组合物包含约0.5-10重量%。约占表面活性剂的0.2-10重量%。萜烯,其余为水。最优选地,组合物包含约3-6重量%。表面活性剂的量为约4-8重量%。萜烯,其余为水。表面活性剂优选为非离子表面活性剂或其混合物,并且萜烯为d-柠檬烯。本文还提供了浓缩物制剂,可以通过用水稀释来制备水性显影剂组合物,通常其量为浓缩物的约五至十倍。

著录项

  • 公开/公告号BR8903684A

    专利类型

  • 公开/公告日1990-03-13

    原文格式PDF

  • 申请/专利权人 M&T CHEMICALS INC.;

    申请/专利号BR19898903684

  • 发明设计人 PAUL LING KONG HUNG;KENNETH KUO SHO TSENG;

    申请日1989-07-25

  • 分类号G03C5/30;G03C5/06;

  • 国家 BR

  • 入库时间 2022-08-22 06:19:54

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