The transport and processing installation (10), which provides the transfer of successive wafers (12) under floating condition through a tunnel passage (14), comprises an inlet chamber block (16), an outlet chamber block (18), and a tunnel passage (14). Gaseous medium for successively transferring wafers under floating condition is introduced into the inlet chamber block through a supply channel perpendicular to the tunnel passage, and discharged through a discharge channel arranged near the supply channel. The tunnel passage between the blocks allows the wafers to be transferred from the inlet chamber block to the outlet chamber block.
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