首页> 外国专利> GASEOUS LOCK FOR ENTRANCE AND EXIT OF TUNNEL IN WHICH TRANSPORT AND PROCESSING OF WAFERS TAKE PLACE UNDER DOUBLE FLOATING CONDITION

GASEOUS LOCK FOR ENTRANCE AND EXIT OF TUNNEL IN WHICH TRANSPORT AND PROCESSING OF WAFERS TAKE PLACE UNDER DOUBLE FLOATING CONDITION

机译:在双浮点条件下运输和加工晶片的隧道入口和出口的气闸

摘要

The transport and processing installation (10), which provides the transfer of successive wafers (12) under floating condition through a tunnel passage (14), comprises an inlet chamber block (16), an outlet chamber block (18), and a tunnel passage (14). Gaseous medium for successively transferring wafers under floating condition is introduced into the inlet chamber block through a supply channel perpendicular to the tunnel passage, and discharged through a discharge channel arranged near the supply channel. The tunnel passage between the blocks allows the wafers to be transferred from the inlet chamber block to the outlet chamber block.
机译:输送和处理设备(10)在浮动状态下通过隧道通道(14)输送连续的晶片(12),该设备包括一个入口室块(16),一个出口室块(18)和一个隧道段落(14)。用于在悬浮状态下连续转移晶片的气态介质通过垂直于隧道通道的供应通道引入到入口腔体中,并通过布置在供应通道附近的排放通道排出。块之间的隧道通道允许晶片从入口室块转移到出口室块。

著录项

  • 公开/公告号KR900001230B1

    专利类型

  • 公开/公告日1990-03-05

    原文格式PDF

  • 申请/专利权人 BOKE EDWARD;

    申请/专利号KR19860002475

  • 发明设计人 BOKE EDWARD;

    申请日1986-04-01

  • 分类号H01L21/00;

  • 国家 KR

  • 入库时间 2022-08-22 06:12:55

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