DEVICE FOR FORMING FUNCTIONAL DEPOSITED FILM BY MICROWAVE PLASMA CVD METHOD HAVING IMPROVED MICROWAVE INTRODUCING WINDOW

摘要

PURPOSE:To effectively introduce a microwave into a reaction chamber and to improve the film forming performance of a microwave plasma CVD device by forming the microwave introducing window in the device with two microwave-transmissive dielectrics and interposing a heat-conductive medium between the dielectrics. CONSTITUTION:The deposited film of amorphous silicon, etc., is formed on the surface of a cylindrical substrate 305 in the vacuum reaction vessel 301. In this case, gaseous silane is supplied into the vessel 301 from a microwave inlet window 302, and the gaseous silane in a discharge space 306 is excited and dissociated by the microwave energy to deposit the thin film of amorphous silicon on the surface of the substrate 305. In this case, the microwave introducing window is formed by the first window 102 and second window 103 made of a microwave-transmissive dielectric, the liq. or semisolid heat-conductive medium 111 of silicone grease, etc., is interposed between the windows to cool the window 302 without disturbing the introduction of the microwave, and the deposited film of amorphous silicon, etc., is stably formed on the surface of the substrate 305.