METHOD AND DEVICE FOR CONTINUOUSLY FORMING FUNCTIONAL DEPOSITED FILM OF LARGE AREA BY MICROWAVE PLASMA CVD METHOD

摘要

PURPOSE:To confine microwave plasma in a film-forming space, to improve the stability and reproducibility of the microwave plasma as well as to enhance the utilization efficiency of raw gas for deposited film forming use by a method wherein a microwave energy is made to radiate substantially in parallel to the sidewalls of film-forming chambers. CONSTITUTION:A pair of microwave applicators 107 and 108 are provided in opposition to each other as prescribed, the tip parts of the applicators are respectively provided with microwave introducing windows 109 and 110 and dielectric sheets 117 and 118 are respectively provided on the surfaces of said microwave introducing windows. While a striplike member 101 is kept into a form curved cylindrically by rollers 102 and 103 for support and transfer use and rings 104 and 105 for support and transfer use, film-forming chambers 116 are continuously formed of the member 101. A microwave energy is made to radiate substantially in parallel to the member 101 constituting the sidewall of a film-forming space. Thereby, microwave plasma is confined in the film-forming space and a deposited film of an arbitrary film thickness can be deposited and formed with good evenness over a large area, for a long time and continuously.