首页> 外国专利> BICMOS integrated circuit having a shallow trench bipolar transistor with vertical base contacts

BICMOS integrated circuit having a shallow trench bipolar transistor with vertical base contacts

机译:具有具有垂直基极接触的浅沟槽双极晶体管的BICMOS集成电路

摘要

An improved bipolar transistor of a BiCMOS integrated circuit (9) is fabricated by utilizing a shallow trench (64) structure. The shallow trench (64) defines an active base (67) and a self-aligned emitter (69). The base resistance of the transistor is reduced because a vertical, rather than lateral, link base, which connects an extrinsic base (51) to the active base (67), is formed. In addition, the overall area is reduced, which provides for a lower collector to base capacitance.
机译:通过利用浅沟槽(64)结构来制造BiCMOS集成电路(9)的改进的双极晶体管。浅沟槽(64)限定了有源基极(67)和自对准发射极(69)。由于形成了将非本征基极(51)连接到有源基极(67)的垂直而不是横向的连接基极,所以减小了晶体管的基极电阻。另外,减小了总面积,这提供了较低的集电极至基极电容。

著录项

  • 公开/公告号EP0411947A1

    专利类型

  • 公开/公告日1991-02-06

    原文格式PDF

  • 申请/专利权人 MOTOROLA INC.;

    申请/专利号EP19900308538

  • 发明设计人 FORD JENNY M.;

    申请日1990-08-02

  • 分类号H01L21/82;H01L27/06;

  • 国家 EP

  • 入库时间 2022-08-22 05:53:15

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号