首页> 外国专利> Bipolar transistor used for high frequency circuits and highly integrated electronic circuits comprises a base layer having a partial vertical structure and a contact arranged on a side wall of the vertical structure

Bipolar transistor used for high frequency circuits and highly integrated electronic circuits comprises a base layer having a partial vertical structure and a contact arranged on a side wall of the vertical structure

机译:用于高频电路和高度集成电子电路的双极晶体管包括具有部分垂直结构的基层和布置在垂直结构的侧壁上的触点

摘要

Bipolar transistor (1) comprises a layer sequence consisting of an emitter layer (5), a base layer (4) and a collector layer (2, 3). The base layer has at least a partial vertical structure and a contact (9, 10) of the base layer is arranged on at least one side wall of the vertical structure. An Independent claim is also included for a method for producing the bipolar transistor. Preferred Features: The side wall of the base layer with the contact runs at an angle to the layer sequence. The layer sequence has a pyramidal or conical structure. The contact comprises a highly doped diffusion layer arranged on the side wall of the base layer. The layer sequence consists of layers constructed from different semi-conductor materials, preferably silicon.
机译:双极晶体管(1)包括由发射极层(5),基极层(4)和集电极层(2、3)组成的层序列。所述基层具有至少部分垂直结构,并且所述基层的接触部(9、10)布置在所述垂直结构的至少一个侧壁上。还包括用于制造双极晶体管的方法的独立权利要求。首选功能:带有触点的基础层的侧壁与层序列成一定角度。层序列具有金字塔形或圆锥形结构。接触件包括布置在基础层的侧壁上的高掺杂扩散层。层序列由由不同的半导体材料,优选由硅构成的层组成。

著录项

  • 公开/公告号DE10042343A1

    专利类型

  • 公开/公告日2002-03-28

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2000142343

  • 发明设计人 BENEDIX ALEXANDER;KLEHN BERND;

    申请日2000-08-29

  • 分类号H01L29/732;H01L29/73;H01L29/737;H01L21/331;

  • 国家 DE

  • 入库时间 2022-08-22 00:27:29

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